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MG Chemicals

"POSITIVE PHOTO RESIST DEVELOPER, CONCENTRATED" (418-500ML)

"POSITIVE PHOTO RESIST DEVELOPER, CONCENTRATED" (418-500ML)

$17.06 USD
$17.06 USD
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Description:For removing exposed resist during the positive photofabrication process. Features:Disolves exposed photoresist Concentrated formulation - dilute one part developer to ten parts water For best results; use in conjunction with M.G. Foam Brush (Cat. No. 416-S) Also available in the M.G. Photofabrication Kit (Cat. No. 416-K) . 418-500MLManufacturer:MG ChemicalsProduct Category:ChemicalsRoHS:CompliantProduct:Prototyping/Board RepairType:DeveloperSize:17 ozContainer:BottleFactory Pack Quantity:6Unit Weight:8 lbs

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